JPH023979B2 - - Google Patents

Info

Publication number
JPH023979B2
JPH023979B2 JP56013170A JP1317081A JPH023979B2 JP H023979 B2 JPH023979 B2 JP H023979B2 JP 56013170 A JP56013170 A JP 56013170A JP 1317081 A JP1317081 A JP 1317081A JP H023979 B2 JPH023979 B2 JP H023979B2
Authority
JP
Japan
Prior art keywords
photosensitive material
positive film
original negative
exposing
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56013170A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57128337A (en
Inventor
Yoshio Mizuno
Nagahiro Tsurukubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP56013170A priority Critical patent/JPS57128337A/ja
Publication of JPS57128337A publication Critical patent/JPS57128337A/ja
Publication of JPH023979B2 publication Critical patent/JPH023979B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56013170A 1981-01-31 1981-01-31 Plate making method Granted JPS57128337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56013170A JPS57128337A (en) 1981-01-31 1981-01-31 Plate making method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56013170A JPS57128337A (en) 1981-01-31 1981-01-31 Plate making method

Publications (2)

Publication Number Publication Date
JPS57128337A JPS57128337A (en) 1982-08-09
JPH023979B2 true JPH023979B2 (en]) 1990-01-25

Family

ID=11825694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56013170A Granted JPS57128337A (en) 1981-01-31 1981-01-31 Plate making method

Country Status (1)

Country Link
JP (1) JPS57128337A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03231015A (ja) * 1990-02-07 1991-10-15 Mitsubishi Motors Corp 車輪のアライメント制御装置
JPH03231016A (ja) * 1990-02-07 1991-10-15 Mitsubishi Motors Corp 車輪のキャンバ角制御装置
JPH04110216A (ja) * 1990-08-31 1992-04-10 Mitsubishi Motors Corp 車両用キャスタ角制御装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03231015A (ja) * 1990-02-07 1991-10-15 Mitsubishi Motors Corp 車輪のアライメント制御装置
JPH03231016A (ja) * 1990-02-07 1991-10-15 Mitsubishi Motors Corp 車輪のキャンバ角制御装置
JPH04110216A (ja) * 1990-08-31 1992-04-10 Mitsubishi Motors Corp 車両用キャスタ角制御装置

Also Published As

Publication number Publication date
JPS57128337A (en) 1982-08-09

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